• DocumentCode
    2334380
  • Title

    A new defect distribution metrology with a consistent discrete exponential formula and its applications

  • Author

    Sato, Hisako ; Ikota, Masami ; Sugimoto, Aritoshi ; Masuda, Hiroo

  • Author_Institution
    Device Dev. Center, Hitachi Ltd., Tokyo, Japan
  • fYear
    1998
  • fDate
    35953
  • Firstpage
    28
  • Lastpage
    31
  • Abstract
    We have proposed a novel discrete exponential distribution function, which describes defect-count distributions on wafers and/or chips more accurately, especially for near-defect-free conditions. The conventional approach based on a gamma probability density function (g-PDF) is known to fail in terms of expressing defect-free wafers or chips, which always gives 0 PDF value. Since the number of faults/defects should be countable (discrete) and analyzed in terms of a nondefective chip yield, the g-PDF cannot be used due to its inaccuracy in near-defect-free conditions. A new discrete formula which is based on the idea of a discrete exponential PDF has been developed. It describes the situation of the defect-count distribution of near-defect-free wafers well. It is experimentally proved that defect-count distributions are approximated with the new model to within an average error of about 0.01 defects/wafer using film deposition process data
  • Keywords
    exponential distribution; integrated circuit measurement; integrated circuit yield; semiconductor process modelling; statistical analysis; chip defect-count distributions; defect distribution metrology; defect-count distribution; defect-free chips; defect-free wafers; discrete exponential PDF; discrete exponential distribution function; discrete exponential formula; film deposition process data; gamma probability density function; model average error; near-defect-free conditions; near-defect-free wafers; nondefective chip yield; wafer defect-count distributions; CMOS technology; Convolution; Exponential distribution; Gaussian distribution; Hydrogen; Inspection; Metrology; Particle measurements; Probability density function; Semiconductor device modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Statistical Metrology, 1998. 3rd International Workshop on
  • Conference_Location
    Honolulu, HI
  • Print_ISBN
    0-7803-4338-7
  • Type

    conf

  • DOI
    10.1109/IWSTM.1998.729761
  • Filename
    729761