Temperature dependent emissivity metrology development at NIST in support of RTP needs

Author

Hanssen, Leonard M. ; Khromchenko, Vladimir ; Mekhontsev, Sergey N.

Author_Institution

NIST, Gaithersburg, MD, USA

fYear

2003

fDate

23-26 Sept. 2003

Firstpage

137

Lastpage

141

Abstract

Measurement instrumentation and methodology for temperature dependent emissivity of solid materials are under development in NIST´s Fourier Transform Spectrophotometry Laboratory. The effort is directed to support US industrial needs for emissivity data and standards for a broad range of applications including rapid thermal processing (RTP). The measurement approach and instrumentation design for several systems under construction are described. In particular, a vacuum goniometer for reflectance and transmittance measurement has been designed for the characterization of the emissivity of RTP samples.

Keywords

emissivity; goniometers; light transmission; measurement standards; rapid thermal processing; reflectometry; Fourier transform spectrophotometry laboratory; NIST; RTP; emissivity; reflectance; temperature dependence; transmittance; vacuum goniometer; Construction industry; Fourier transforms; Goniometers; Instruments; Laboratories; Metrology; NIST; Rapid thermal processing; Solids; Temperature dependence;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Thermal Processing of Semiconductors, 2003. RTP 2003. 11th IEEE International Conference on

Print_ISBN

0-7803-7874-1

Type

conf

DOI

10.1109/RTP.2003.1249135

Filename

1249135