DocumentCode
2349503
Title
Effects of dry etching damage removal on Si selective epitaxial growth
Author
Chang, C.Y. ; Tseng, H.-C. ; Ueng, S.Y. ; Chen, H.C. ; Chen, L.P.
Author_Institution
National Chiao Tung University
fYear
1994
fDate
1994
Keywords
Argon; Contamination; Dry etching; Epitaxial growth; Laboratories; Oxidation; Scanning electron microscopy; Silicon; Surface cleaning; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
Type
conf
DOI
10.1109/EDMS.1994.863889
Filename
863889
Link To Document