• DocumentCode
    2352777
  • Title

    Motorola´s strategy for reducing PFC emissions

  • Author

    Beu, Laurie ; Brown, Paul Thomas

  • Author_Institution
    Motorola Inc., Austin, TX, USA
  • fYear
    1998
  • fDate
    19-21 Oct 1998
  • Firstpage
    277
  • Lastpage
    285
  • Abstract
    PFCs are used in the semiconductor industry for plasma etching and chamber cleaning. The Kyoto Protocol, the DuPont policy, and the Memorandum of Understanding (MOU) that many semiconductor manufacturers signed with the US Environmental Protection Agency (EPA) are driving forces behind the reduction of PFC emissions. The Kyoto Protocol includes perfluorocarbons (PFCs), hydrofluorocarbons (HFCs) and sulfur hexafluoride (SF6) in the basket of greenhouse gases which are subject to emissions reduction requirements during 2008-2012. DuPont, the sole US manufacturer of C2F6, issued a policy which requires industry to implement emissions reduction solutions in 1999. The EPA/MOU requires a two year technology development period (ending Spring, 1998), after which time the industry will meet with EPA to discuss establishment of specific reduction targets. Japan, Europe and Korea have developed voluntary PFC emissions reduction initiatives for semiconductor operations in their countries similar to the EPA MOU. Motorola has worked preactively over the past five years to understand its contribution to PFC emissions and to identify means for controlling emissions. This paper summarizes Motorola´s research and development of PFC emissions reduction techniques. It also discusses the factors that affect the application of reduction technologies. The paper concludes with a discussion of Motorola´s strategy for reducing PFC emissions
  • Keywords
    environmental factors; integrated circuit technology; legislation; organic compounds; sputter etching; surface cleaning; DuPont policy; HFC emissions; Kyoto Protocol; Memorandum of Understanding; Motorola; PFC emission control; PFC emission reduction strategy; PFC emissions; SF6; SF6 emissions; US EPA; US Environmental Protection Agency; chamber cleaning; emission reduction targets; emission reduction technology application factors; emissions reduction; hydrofluorocarbon emissions; perfluorocarbon emissions; plasma etching; semiconductor industry; semiconductor manufacturers; sulfur hexafluoride emissions; technology development period; voluntary PFC emissions reduction initiatives; Cleaning; Electronics industry; Etching; Hybrid fiber coaxial cables; Manufacturing industries; Plasma applications; Plasma materials processing; Protection; Protocols; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Manufacturing Technology Symposium, 1998. Twenty-Third IEEE/CPMT
  • Conference_Location
    Austin, TX
  • ISSN
    1089-8190
  • Print_ISBN
    0-7803-4523-1
  • Type

    conf

  • DOI
    10.1109/IEMT.1998.731084
  • Filename
    731084