FEOL post CMP cleaner development

Changes to the number and types of films exposed during cleaning and changes to slurries have promoted a new need for formulated cleans in the Front End of the Line (FEOL). Changes to the particles used in slurries have made many of the traditional pCMP cleaners ineffective for this process. Further, the ideal clean should be a one-step process. These changes are pushing companies to consider formulated cleans over commodities cleans. A formulated clean can remove particles and metal contamination all in one step while protecting the underlying thin films. We will show a path toward the development of these new cleaners.