DocumentCode
235710
Title
Effect of slurry temperature on removal characteristics in cadmium telluride CMP
Author
Byeongcheol Shin ; Dasol Lee ; Eunjeong Park ; Haedo Jeong
Author_Institution
Grad. Sch. of Mech. Eng., Pusan Nat. Univ., Busan, South Korea
fYear
2014
fDate
19-21 Nov. 2014
Firstpage
300
Lastpage
301
Abstract
Cadmium Telluride (CdTe), one of II-VI group compound semiconductors, was used as a material of X-Ray detector, since it has good features of high absorption rate and high conversion efficiency of X-Ray, resulting from its excellent electric properties. However, a rough surface of the CdTe thin-film causes a delay of electric speed and current concentration to the uneven part of the surface, resulting in making electric uniformity worse. Therefore, it is necessary to improve the surface roughness of the CdTe X-Ray detector which is possible to achieve a higher electric uniformity, a shorter signal delay, and more clear images.
Keywords
II-VI semiconductors; X-ray detection; cadmium compounds; chemical mechanical polishing; delays; slurries; surface roughness; CdTe; X-ray detector material; cadmium telluride CMP; current concentration; electric speed delay; electric uniformity; removal characteristics; slurry temperature; surface roughness; Chemicals; Educational institutions; Rough surfaces; Slurries; Surface roughness; Surface treatment; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Planarization/CMP Technology (ICPT), 2014 International Conference on
Conference_Location
Kobe
Print_ISBN
978-1-4799-5556-5
Type
conf
DOI
10.1109/ICPT.2014.7017304
Filename
7017304
Link To Document