• DocumentCode
    235710
  • Title

    Effect of slurry temperature on removal characteristics in cadmium telluride CMP

  • Author

    Byeongcheol Shin ; Dasol Lee ; Eunjeong Park ; Haedo Jeong

  • Author_Institution
    Grad. Sch. of Mech. Eng., Pusan Nat. Univ., Busan, South Korea
  • fYear
    2014
  • fDate
    19-21 Nov. 2014
  • Firstpage
    300
  • Lastpage
    301
  • Abstract
    Cadmium Telluride (CdTe), one of II-VI group compound semiconductors, was used as a material of X-Ray detector, since it has good features of high absorption rate and high conversion efficiency of X-Ray, resulting from its excellent electric properties. However, a rough surface of the CdTe thin-film causes a delay of electric speed and current concentration to the uneven part of the surface, resulting in making electric uniformity worse. Therefore, it is necessary to improve the surface roughness of the CdTe X-Ray detector which is possible to achieve a higher electric uniformity, a shorter signal delay, and more clear images.
  • Keywords
    II-VI semiconductors; X-ray detection; cadmium compounds; chemical mechanical polishing; delays; slurries; surface roughness; CdTe; X-ray detector material; cadmium telluride CMP; current concentration; electric speed delay; electric uniformity; removal characteristics; slurry temperature; surface roughness; Chemicals; Educational institutions; Rough surfaces; Slurries; Surface roughness; Surface treatment; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Planarization/CMP Technology (ICPT), 2014 International Conference on
  • Conference_Location
    Kobe
  • Print_ISBN
    978-1-4799-5556-5
  • Type

    conf

  • DOI
    10.1109/ICPT.2014.7017304
  • Filename
    7017304