DocumentCode
235719
Title
Measurements of normal and friction forces during brush scrubbing
Author
Nishio, Kenya ; Hara, Yoshitaka ; Sanada, Toshiyuki ; Hiyama, Hirokuni ; Fukunaga, Akira
Author_Institution
Dept. of Mech. Eng., Shizuoka Univ., Hamamatsu, Japan
fYear
2014
fDate
19-21 Nov. 2014
Firstpage
334
Lastpage
336
Abstract
In order to gain some insights for post CMP cleaning, we measured the forces during brush scrubbing. In this experiment, both the normal force Fn and shear (friction) force Fs generated by a single sponge sliding on the plate were measured. The Fn of PVA increased quickly and attained its maximum value. After that, Fn gradually decreased to a constant value even in the same compression distance. Fs followed the same trend as well. This result indicates that the initial contact of PVA brush generate high friction force. The Fn of polyurethane also increased quickly and attained its maximum value, however the Fs do not followed. On the contrary, the both forces of melamine show the almost constant value. In addition, we observed the impact behavior of PVA brush by high-speed photograph. When the impact speed is slow, water inside the brush remains around the brush, however water is spattered to the surrounding air as increasing the impact speed.
Keywords
brushes; chemical mechanical polishing; force measurement; friction; surface cleaning; PVA brush; during brush scrubbing; friction force measurement; normal force measurement; post CMP cleaning; shear force; sponge sliding; Brushes; Cleaning; Educational institutions; Force; Force measurement; Friction; Semiconductor device measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Planarization/CMP Technology (ICPT), 2014 International Conference on
Conference_Location
Kobe
Print_ISBN
978-1-4799-5556-5
Type
conf
DOI
10.1109/ICPT.2014.7017313
Filename
7017313
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