• DocumentCode
    235719
  • Title

    Measurements of normal and friction forces during brush scrubbing

  • Author

    Nishio, Kenya ; Hara, Yoshitaka ; Sanada, Toshiyuki ; Hiyama, Hirokuni ; Fukunaga, Akira

  • Author_Institution
    Dept. of Mech. Eng., Shizuoka Univ., Hamamatsu, Japan
  • fYear
    2014
  • fDate
    19-21 Nov. 2014
  • Firstpage
    334
  • Lastpage
    336
  • Abstract
    In order to gain some insights for post CMP cleaning, we measured the forces during brush scrubbing. In this experiment, both the normal force Fn and shear (friction) force Fs generated by a single sponge sliding on the plate were measured. The Fn of PVA increased quickly and attained its maximum value. After that, Fn gradually decreased to a constant value even in the same compression distance. Fs followed the same trend as well. This result indicates that the initial contact of PVA brush generate high friction force. The Fn of polyurethane also increased quickly and attained its maximum value, however the Fs do not followed. On the contrary, the both forces of melamine show the almost constant value. In addition, we observed the impact behavior of PVA brush by high-speed photograph. When the impact speed is slow, water inside the brush remains around the brush, however water is spattered to the surrounding air as increasing the impact speed.
  • Keywords
    brushes; chemical mechanical polishing; force measurement; friction; surface cleaning; PVA brush; during brush scrubbing; friction force measurement; normal force measurement; post CMP cleaning; shear force; sponge sliding; Brushes; Cleaning; Educational institutions; Force; Force measurement; Friction; Semiconductor device measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Planarization/CMP Technology (ICPT), 2014 International Conference on
  • Conference_Location
    Kobe
  • Print_ISBN
    978-1-4799-5556-5
  • Type

    conf

  • DOI
    10.1109/ICPT.2014.7017313
  • Filename
    7017313