Degradation behavior of ceria-based abrasives slurry during glass polishing

Ceria-based abrasives are indispensable for precise polishing of glass substrates. It is of great importance to understand degradation behavior of abrasive slurry for reducing the polishing costs. In this study, we quantitatively investigated the degradation behavior of ceria-based abrasive slurry in glass polishing. Degradation profiles were found to be classified into two regions; the region where degradation was not severe (Region I) and the region where the removal rate rapidly decreased with polishing time (Region Π). The results suggested that the removed glass fragments would cover the active sites of abrasives resulting in the transition from Region I to Region II.