DocumentCode
2359497
Title
The experiment of applying a plasma chemical reaction and a nonplasma chemical reaction in the RF ion source
Author
Bin, Bai Gui
Author_Institution
Inst. of Low Energy Nucl. Phys., Beijing Normal Univ., China
fYear
1989
fDate
20-23 Mar 1989
Firstpage
279
Abstract
The author reports an experimental study regarding the application of a plasma chemical reaction and to nonplasma chemical reaction in an RF ion source. Conditions were established under which the plasma denudation rate compares with that for nonplasma. The experiment made it possible to select the structure of the metal ion extracted by the applying plasma chemical reaction in the RF ion source
Keywords
chemical reactions; ion sources; RF ion source; metal ion; nonplasma chemical reaction; plasma chemical reaction; plasma denudation rate; Chemical processes; Chromium; Coils; Fault location; Glass; Plasma chemistry; Plasma materials processing; Plasma sources; Radio frequency; Tungsten;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 1989. Accelerator Science and Technology., Proceedings of the 1989 IEEE
Conference_Location
Chicago, IL
Type
conf
DOI
10.1109/PAC.1989.73146
Filename
73146
Link To Document