• DocumentCode
    2365692
  • Title

    Single Ended Static Random Access Memory for Low-Vdd, High-Speed Embedded Systems

  • Author

    Singh, Jawar ; Mathew, Jimson ; Mohanty, Saraju P. ; Pradhan, Dhiraj K.

  • Author_Institution
    Dept. of Comput. Sci., Univ. of Bristol, Bristol
  • fYear
    2009
  • fDate
    5-9 Jan. 2009
  • Firstpage
    307
  • Lastpage
    312
  • Abstract
    Single-ended static random access memory (SE-SRAM) is well known for their tremendous potential of low active power and leakage dissipations. In this paper, we present a novel six-transistor (6T) SE-SRAM bitcell for low-Vdd and high speed embedded applications with significant improvement in their power, performance and stability under process variations. The proposed design has a strong 2.65times worst case read static noise margin (SNM) compared to a standard 6T SRAM. A strong write-ability of logic ´one´ is achieved, which is problematic in SE-SRAM cells even at lower voltage. The proposed bitcell design is mainly targeted for word-organized SRAMs. A 16 times 16 times 32 bit SRAM with proposed and standard 6T bitcells is simulated (including parasitics) for 65 nm CMOS technology to evaluate and compare the different performance parameters, such as, read SNM, write-ability, access delay and power. The dynamic and leakage power dissipation in the proposed 6T design is reduced by 28% and 21%, respectively, as compared to standard 6T design.
  • Keywords
    CMOS digital integrated circuits; SRAM chips; embedded systems; CMOS technology; access delay; high-speed embedded systems; leakage dissipations; low active power; low-Vdd; read SNM; single ended static random access memory; six-transistor SRAM; size 65 nm; worst case read static noise margin; write-ability; Batteries; CMOS technology; Capacitance; Computer science; Embedded system; Logic; Random access memory; SRAM chips; Stability; Voltage; Low Power SRAM; Nano-CMOS; Process Variations; SRAM;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Design, 2009 22nd International Conference on
  • Conference_Location
    New Delhi
  • ISSN
    1063-9667
  • Print_ISBN
    978-0-7695-3506-7
  • Type

    conf

  • DOI
    10.1109/VLSI.Design.2009.38
  • Filename
    4749692