• DocumentCode
    2366697
  • Title

    Transient voltage induced leakage current in power diode with SIPOS resistive field plate

  • Author

    Yahata, Akihiro ; Atsuta, Masaki

  • Author_Institution
    Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan
  • fYear
    1995
  • fDate
    23-25 May 1995
  • Firstpage
    400
  • Lastpage
    403
  • Abstract
    Leakage current of current diode was found to flow at a much lower voltage than that of avalanche breakdown under the conditions of high voltage rise rate (dV/dt) and low frequency, and this leakage current was characteristic of semi-insulating polycrystalline silicon (SIPOS) resistive field plate (RFP). This current has not been reported previously, and we call it transient voltage induced leakage current (TVIC). TVIC can be suppressed by optimizing the reduced surface field (RESURF) structure. The electric charge for TVIC increased as both the applied voltage and the pulse time interval increased whereas it decreased as the temperature increased. A possible model explaining TVIC mechanism was presented
  • Keywords
    elemental semiconductors; leakage currents; power semiconductor diodes; semiconductor device models; silicon; SIPOS resistive field plate; Si; TVIC mechanism model; applied voltage; power semiconductor diode; pulse time interval; reduced surface field structure; semi-insulating polycrystalline silicon; transient voltage induced leakage current; voltage rise rate; Anodes; Avalanche breakdown; Breakdown voltage; Conductivity; Diodes; Fabrication; Frequency; Leakage current; Silicon; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 1995. ISPSD '95., Proceedings of the 7th International Symposium on
  • Conference_Location
    Yokohama
  • ISSN
    1063-6854
  • Print_ISBN
    0-7803-2618-0
  • Type

    conf

  • DOI
    10.1109/ISPSD.1995.515071
  • Filename
    515071