• DocumentCode
    2367874
  • Title

    Product drift from NBTI: Guardbanding, circuit and statistical effects

  • Author

    Krishnan, Anand T. ; Cano, Frank ; Chancellor, Cathy ; Reddy, Vijay ; Qi, Zhangfen ; Jain, Palkesh ; Carulli, John ; Masin, Jonathan ; Zuhoski, Steve ; Krishnan, Srikanth ; Ondrusek, Jay

  • Author_Institution
    Technol. Design Integration, Texas Instrum., Dallas, TX, USA
  • fYear
    2010
  • fDate
    6-8 Dec. 2010
  • Abstract
    Circuits employing advanced performance and power management techniques (clock gating, half-cycle paths) are found to be much more sensitive to NBTI primarily due to differential and asymmetric aging, with a 1% transistor drift leading to as much as 3% circuit drift in some cases. For the first time, we report a monotonic reduction in variance of the log parameters (Ln(ΔF/F) and Ln(ΔID/ID)) as a function of stress time. A stochastic guard banding model accounting for time-dependent variance, re-ordering effects and granularity of data is demonstrated.
  • Keywords
    MOSFET; circuit stability; integrated circuit reliability; statistical analysis; stochastic processes; asymmetric aging; circuit drift; data granularity; differential aging; log parameter; monotonic reduction; negative bias temperature instability; power management technique; statistical effect; stochastic guard banding model; time-dependent variance; transistor drift;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2010 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4424-7418-5
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2010.5703294
  • Filename
    5703294