• DocumentCode
    2369553
  • Title

    TCAD: Present state and future challenges

  • Author

    Ma, Terry ; Moroz, Victor ; Borges, Ricardo ; Smith, Lee

  • Author_Institution
    Synopsys, Inc., Mountain View, CA, USA
  • fYear
    2010
  • fDate
    6-8 Dec. 2010
  • Abstract
    Since the advent of computer modeling of semiconductor processes and devices in the 1970s, Technology Computer-Aided Design (TCAD) has been an integral part of technology development over the past four decades. Today, the use of TCAD has become widespread not only for “More Moore,” but also “More Than Moore” technologies (Fig. 1). As process and device complexity continues to rise, so does the complexity in technology modeling. This paper discusses the present state and future challenges of front-end process and device modeling.
  • Keywords
    circuit CAD; TCAD; computer modeling; device complexity; semiconductor devices; semiconductor processes; technology computer-aided design; technology development; technology modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2010 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4424-7418-5
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2010.5703367
  • Filename
    5703367