DocumentCode
2369553
Title
TCAD: Present state and future challenges
Author
Ma, Terry ; Moroz, Victor ; Borges, Ricardo ; Smith, Lee
Author_Institution
Synopsys, Inc., Mountain View, CA, USA
fYear
2010
fDate
6-8 Dec. 2010
Abstract
Since the advent of computer modeling of semiconductor processes and devices in the 1970s, Technology Computer-Aided Design (TCAD) has been an integral part of technology development over the past four decades. Today, the use of TCAD has become widespread not only for “More Moore,” but also “More Than Moore” technologies (Fig. 1). As process and device complexity continues to rise, so does the complexity in technology modeling. This paper discusses the present state and future challenges of front-end process and device modeling.
Keywords
circuit CAD; TCAD; computer modeling; device complexity; semiconductor devices; semiconductor processes; technology computer-aided design; technology development; technology modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location
San Francisco, CA
ISSN
0163-1918
Print_ISBN
978-1-4424-7418-5
Electronic_ISBN
0163-1918
Type
conf
DOI
10.1109/IEDM.2010.5703367
Filename
5703367
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