• DocumentCode
    2371000
  • Title

    NIST comparison of the quantized Hall resistance and the realization of the SI ohm through the calculable capacitor

  • Author

    Jeffrey, Alan ; Elmquist, R.E. ; Lee, L.H. ; Shields, J.Q. ; Dziuba, R.F.

  • Author_Institution
    Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
  • fYear
    1996
  • fDate
    17-21 June 1996
  • Firstpage
    10
  • Lastpage
    11
  • Abstract
    The latest NIST results from the comparison of the quantized Hall resistance (QI-IR), with the realization of the SI ohm obtained from the calculable capacitor measurement are reported. Various systematic checks have been performed.
  • Keywords
    electric resistance measurement; quantum Hall effect; units (measurement); AC measurements; DC measurements; Hamon device; NIST comparison; SI ohm; calculable capacitor; calculable capacitor measurement; cryogenic current comparator; periodic comparisons; quantized Hall resistance; systematic checks; Bridges; Current measurement; Detectors; Electrical resistance measurement; Gain measurement; Leak detection; Measurement standards; NIST; Q measurement; Resistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Precision Electromagnetic Measurements Digest, 1996 Conference on
  • Conference_Location
    Braunschweig, Germany
  • Print_ISBN
    0-7803-3376-4
  • Type

    conf

  • DOI
    10.1109/CPEM.1996.546531
  • Filename
    546531