DocumentCode
2371032
Title
Electron trapping effect on the switching behavior of contact RRAM devices through random telegraph noise analysis
Author
Tseng, Yuan Heng ; Shen, Wen Chao ; Huang, Chia-En ; Lin, Chrong Jung ; King, Ya-Chin
Author_Institution
Microelectron. Lab., Nat. Tsing-Hua Univ., Hsinchu, Taiwan
fYear
2010
fDate
6-8 Dec. 2010
Abstract
Single electron trapping/de-trapping behavior is firstly observed and investigated in the contact resistive random access memory cell. By analyzing the random telegraph noise, the temperature-dependency of resistance levels and the high-temperature data retention behavior of the contact RRAM film are successfully explained. Detail analyses on the capture and emission of electrons in this contact RRAM cell provide further verifications for the proposed trap-induced resistive switching model.
Keywords
electron traps; integrated circuit noise; random noise; random-access storage; switching; contact RRAM devices; contact resistive random access memory cell; detrapping behavior; electron trapping effect; high-temperature data retention behavior; random telegraph noise analysis; switching behavior; temperature dependency; trap-induced resistive switching model;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting (IEDM), 2010 IEEE International
Conference_Location
San Francisco, CA
ISSN
0163-1918
Print_ISBN
978-1-4424-7418-5
Electronic_ISBN
0163-1918
Type
conf
DOI
10.1109/IEDM.2010.5703439
Filename
5703439
Link To Document