• DocumentCode
    2371519
  • Title

    Mechanical reliability of polyimide insulated interconnections in epoxy encapsulated package under temperature cycle test

  • Author

    Homma, Yoshio ; Sakuma, Noriyuki ; Nishida, Takashi ; Yoshida, Ikuo

  • Author_Institution
    Central Res. Lab., Hitachi Ltd., Tokyo, Japan
  • fYear
    1991
  • fDate
    11-12 Jun 1991
  • Firstpage
    249
  • Lastpage
    255
  • Abstract
    Deformation mechanism of polyimide insulated Al alloy lines in epoxy encapsulated package was clarified using temperature cycle test. A shrinkage stress due to the resin on top of the chip creates cracks in the epoxy-resin around the chip corners, and the resin delaminates from the chip to shrink. This causes the polyimide film to tear-off, and the 1st level alloy lines to deform, while upper levels enveloped by the polyimide film move without deformation. Following the model, reliability was improved by preventing the cracks being created in the resin, and/or increasing resin adhesion on chip surface
  • Keywords
    VLSI; encapsulation; environmental testing; failure analysis; metallisation; packaging; polymers; reliability; thermal expansion; Al alloy lines; VLSI; epoxy encapsulated package; multilevel interconnection; polyimide insulated interconnections; reliability improvement; reliability issues; shrinkage stress; temperature cycle test; Adhesives; Aluminum alloys; Insulation; Packaging; Polyimides; Resins; Stress; Surface cracks; Temperature; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Multilevel Interconnection Conference, 1991, Proceedings., Eighth International IEEE
  • Conference_Location
    Santa Clara, CA
  • Print_ISBN
    0-87942-673-X
  • Type

    conf

  • DOI
    10.1109/VMIC.1991.152995
  • Filename
    152995