• DocumentCode
    2380479
  • Title

    Thermal conductivity and softening of gate oxide breakdown

  • Author

    Ko, Chin-Yuan ; Liao, P.J. ; Shih, J.R. ; Wang, J.J. ; Peng, Y.K. ; Yue, J.

  • Author_Institution
    Taiwan Semicond. Manuf. Co., Hsin-Chu, Taiwan
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    60
  • Lastpage
    63
  • Abstract
    The TDDB under accumulation and inversion mode was investigated. It is shown that the generation probability of soft breakdown dramatically increases with the stress mode changing from accumulation to inversion. In the accumulation stress mode, there exists a depletion region serving as a thermal barrier; however, in the inversion mode, better thermal conduction induces larger temperature gradient, which causes higher channel current due to the Seebeck effect. Based on the above concept, we develop a modified ramp voltage test which can detect soft defects which can´t be detected by the conventional ramp voltage test.
  • Keywords
    Seebeck effect; accumulation layers; electric breakdown; inversion layers; thermal conductivity; Seebeck effect; TDDB; accumulation mode; accumulation stress mode; channel current; depletion region; gate oxide breakdown; generation probability; inversion mode; modified ramp voltage test; soft breakdown; softening; stress mode; temperature gradient; thermal barrier; thermal conduction; thermal conductivity; Breakdown voltage; Capacitors; Current measurement; Dielectric breakdown; Electric breakdown; MOS devices; Softening; Testing; Thermal conductivity; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma- and Process-Induced Damage, 2002 7th International Symposium on
  • Print_ISBN
    0-9651577-7-6
  • Type

    conf

  • DOI
    10.1109/PPID.2002.1042609
  • Filename
    1042609