DocumentCode
2380479
Title
Thermal conductivity and softening of gate oxide breakdown
Author
Ko, Chin-Yuan ; Liao, P.J. ; Shih, J.R. ; Wang, J.J. ; Peng, Y.K. ; Yue, J.
Author_Institution
Taiwan Semicond. Manuf. Co., Hsin-Chu, Taiwan
fYear
2002
fDate
2002
Firstpage
60
Lastpage
63
Abstract
The TDDB under accumulation and inversion mode was investigated. It is shown that the generation probability of soft breakdown dramatically increases with the stress mode changing from accumulation to inversion. In the accumulation stress mode, there exists a depletion region serving as a thermal barrier; however, in the inversion mode, better thermal conduction induces larger temperature gradient, which causes higher channel current due to the Seebeck effect. Based on the above concept, we develop a modified ramp voltage test which can detect soft defects which can´t be detected by the conventional ramp voltage test.
Keywords
Seebeck effect; accumulation layers; electric breakdown; inversion layers; thermal conductivity; Seebeck effect; TDDB; accumulation mode; accumulation stress mode; channel current; depletion region; gate oxide breakdown; generation probability; inversion mode; modified ramp voltage test; soft breakdown; softening; stress mode; temperature gradient; thermal barrier; thermal conduction; thermal conductivity; Breakdown voltage; Capacitors; Current measurement; Dielectric breakdown; Electric breakdown; MOS devices; Softening; Testing; Thermal conductivity; Thermal stresses;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma- and Process-Induced Damage, 2002 7th International Symposium on
Print_ISBN
0-9651577-7-6
Type
conf
DOI
10.1109/PPID.2002.1042609
Filename
1042609
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