DocumentCode
2387584
Title
EWMA run-to-run controllers with gain updating: Stability and sensitivity analysis
Author
Wang, Jin ; He, Q. Peter
Author_Institution
Dept. of Chem. Eng., Auburn Univ., Auburn, AL
fYear
2008
fDate
11-13 June 2008
Firstpage
2872
Lastpage
2877
Abstract
Exponentially weighted moving average (EWMA) controllers are the most commonly used run-to-run controllers in semiconductor manufacturing. Based on a linear model, an EWMA controller is usually implemented in a way that the process gain is kept as the off-line estimate and the intercept term is updated using an EWMA filter at each run. However, in practice, there are many applications that an EWMA controller is implemented in a way that the process gain is updated in a run-to-run manner while the intercept is kept as the off-line estimate. Although the stability and sensitivity of EWMA controllers with intercept updating has been well known, there is no analysis result on the stability and sensitivity of EWMA controllers with gain updating. In this paper, we analyze the behavior of an EWMA controller with gain updating and compare it to that of an EWMA controller with intercept updating. Both stationary and drifting processes are considered, the expression of the process output are derived and the output variances for stochastic processes are evaluated. In addition, simulation examples are given to illustrate the analysis results.
Keywords
estimation theory; moving average processes; semiconductor device manufacture; sensitivity analysis; stability; EWMA filter; drift process; exponentially weighted moving average run-to-run controller; linear model; offline estimation; semiconductor manufacturing; sensitivity analysis; stability; stationary process; stochastic process; Analytical models; Chemical engineering; Chemical vapor deposition; Etching; Robust control; Robust stability; Sensitivity analysis; Stability analysis; Statistics; Stochastic processes; asymptotic variance; exponentially weighted moving average; sensitivity; stability;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, 2008
Conference_Location
Seattle, WA
ISSN
0743-1619
Print_ISBN
978-1-4244-2078-0
Electronic_ISBN
0743-1619
Type
conf
DOI
10.1109/ACC.2008.4586930
Filename
4586930
Link To Document