DocumentCode
2396297
Title
Effects of Etching Holes on Capacitance and Tuning Range in MEMS Parallel Plate Variable Capacitors
Author
Elshurafa, Arnro Mv ; El-Masry, Ezz I.
Author_Institution
Dept. of Electr. & Comput. Eng., Dalhousie Univ., Halifax, NS
fYear
2006
fDate
27-29 Dec. 2006
Firstpage
221
Lastpage
224
Abstract
This paper presents extensive simulations of MEMS parallel plate variable capacitors with attention dedicated towards variations in etching holes´ properties. For various separation distances between the plates, different hole sizes and density were created and capacitances were extracted. Within typical values, it was found that the configuration of the holes might affect the tuning range by no more than 16% at extreme cases of their theoretical counterparts. Simulations were done using finite element modeling
Keywords
capacitance; capacitors; etching; finite element analysis; micromechanical devices; MEMS; capacitance range; etching holes; finite element modeling; parallel plate variable capacitors; tuning range; Capacitance; Capacitors; Computational modeling; Concurrent computing; Electrostatics; Etching; Fabrication; Finite element methods; Micromechanical devices; Varactors;
fLanguage
English
Publisher
ieee
Conference_Titel
System-on-Chip for Real-Time Applications, The 6th International Workshop on
Conference_Location
Cairo
Print_ISBN
1-4244-0898-9
Type
conf
DOI
10.1109/IWSOC.2006.348240
Filename
4155293
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