Photonic device fabrication inside transparent materials by tailored femtosecond laser processing

Author

Kamata, Masanao ; Obara, Mmoru

Author_Institution

Dept. of Electron. & Electr. Eng., Keio Univ., Yokohama, Japan

Volume

2

fYear

2003

fDate

27-28 Oct. 2003

Firstpage

1026

Abstract

In this paper, we report on the photonic device fabrication inside silica glasses by loosely focused fs laser under the conditions of incident pulsewidth of 150 fs, incident energy of 15 μJ and effective NA of 0.007 and laser irradiation time of 10 min for each line. Diffraction gratings of 10 μm period and waveguide splitters were fabricated by fs laser. We employed a pulsewidth tunable fs laser system based on CPA architecture which we developed and we will discuss optical properties of the fabricated devices.

Keywords

diffraction gratings; high-speed optical techniques; laser beam effects; laser materials processing; laser tuning; optical fabrication; optical glass; optical waveguides; refractive index; silicon compounds; 10 min; 15 muJ; 150 fs; CPA architecture; diffraction grating; laser irradiation time; optical properties; photonic device fabrication; pulsewidth tunable fs laser system; silica glass; tailored femtosecond laser processing; transparent material; waveguide splitter; Glass; Optical device fabrication; Optical diffraction; Optical materials; Optical pulses; Optical waveguides; Silicon compounds; Space vector pulse width modulation; Ultrafast optics; Waveguide lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE

ISSN

1092-8081

Print_ISBN

0-7803-7888-1

Type

conf

DOI

10.1109/LEOS.2003.1253158

Filename

1253158