Periodic silicon nanocones arrays with controllable dimensions prepared by two-step etching using nanosphere lithography and NH4OH/H2O2 solution

Author

Yang, Mingfei ; Yu, Hongyu ; Sun, Xiaowei ; Li, Junshuai ; Li, Xiaocheng ; Ke, Lin ; Hu, Junhui ; Wang, Fei ; Jiao, Zhihui

Author_Institution

Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore

fYear

2010

fDate

14-16 Dec. 2010

Firstpage

1

Lastpage

3

Abstract

An electroless chemical etching technique using polystyrene nanospheres as self-assembled mask is developed to fabricate size-controllable, periodic silicon nanopillars (NPs) and subsequent nanocones (NCs) arrays. The Si NCs are obtained based on the NPs structure using cost-effective ammonia-related etching chemistry. The diameter, height, and periodicity of the NCs can be systematically controlled. This method is potentially beneficial to many device applications including super-capacitors, batteries, solar cell, etc.

Keywords

electroless deposition; elemental semiconductors; etching; nanofabrication; nanolithography; nanostructured materials; self-assembly; semiconductor growth; silicon; Si; cost-effective ammonia-related etching chemistry; electroless chemical etching technique; nanosphere lithography; periodic silicon nanocone arrays; periodic silicon nanopillars; polystyrene nanosphere; self-assembled mask; size-controllable silicon nanopillars; two-step etching; Batteries; Etching; Fabrication; Photovoltaic cells; Reflectivity; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Photonics Global Conference (PGC), 2010

Conference_Location

Singapore

Print_ISBN

978-1-4244-9882-6

Type

conf

DOI

10.1109/PGC.2010.5706020

Filename

5706020