DocumentCode
2406404
Title
Formation of ultra-thin SOI by dose-energy optimization
Author
Chen, Meng ; Wang, Xiang ; Dong, Yeming ; Liu, Xianghua ; Yi, Wangbin ; Chen, Jing ; Wang, Xi
Author_Institution
Shanghai Simgui Technol. Co. Ltd., China
fYear
2002
fDate
7-10 Oct 2002
Firstpage
113
Lastpage
114
Abstract
We report our recent results on low/very low dose-energy combination implantation and its applications on patterned SOI and multi-BOX layer structures.
Keywords
SIMOX; ion implantation; BOX layer; SIMOX wafers; dose-energy optimization; ion implantation; ultra-thin SOI; Ion implantation; SIMOX;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, IEEE International 2002
Print_ISBN
0-7803-7439-8
Type
conf
DOI
10.1109/SOI.2002.1044441
Filename
1044441
Link To Document