DocumentCode
2408516
Title
Secondary ion mass spectrometry analysis of wafer contamination resulting from gloved hands
Author
Morinville, Wendy ; Krasinski, Chantelle
Author_Institution
Surface Anal. Lab., Micron Technol., Inc., Boise, ID
fYear
0
fDate
0-0 0
Lastpage
36
Abstract
It is well known that wafer-handling protocols to avoid contamination are a mandatory part of semiconductor fabrication. One of the most important pieces of the standard "cleanroom" suit is the glove worn to eliminate contamination from human skin, of which mobile ions from fingerprint oils are a major contributor. This paper shows that wafer handling, even with fabrication-recommended gloves in place, can still significantly contaminate the wafer
Keywords
clean rooms; materials handling; secondary ion mass spectroscopy; semiconductor device manufacture; surface contamination; cleanroom suit; fingerprint oils; gloved hands; human skin; mobile ions; secondary ion mass spectrometry analysis; semiconductor fabrication; wafer contamination; wafer-handling protocols; Chemical analysis; Chemical elements; Fingerprint recognition; Humans; Ion beams; Mass spectroscopy; Oils; Silicon; Skin; Surface contamination;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics and Electron Devices, 2006. WMED '06. 2006 IEEE Workshop on
Conference_Location
Boise, ID
Print_ISBN
1-4244-0374-X
Type
conf
DOI
10.1109/WMED.2006.1678296
Filename
1678296
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