• DocumentCode
    2408516
  • Title

    Secondary ion mass spectrometry analysis of wafer contamination resulting from gloved hands

  • Author

    Morinville, Wendy ; Krasinski, Chantelle

  • Author_Institution
    Surface Anal. Lab., Micron Technol., Inc., Boise, ID
  • fYear
    0
  • fDate
    0-0 0
  • Lastpage
    36
  • Abstract
    It is well known that wafer-handling protocols to avoid contamination are a mandatory part of semiconductor fabrication. One of the most important pieces of the standard "cleanroom" suit is the glove worn to eliminate contamination from human skin, of which mobile ions from fingerprint oils are a major contributor. This paper shows that wafer handling, even with fabrication-recommended gloves in place, can still significantly contaminate the wafer
  • Keywords
    clean rooms; materials handling; secondary ion mass spectroscopy; semiconductor device manufacture; surface contamination; cleanroom suit; fingerprint oils; gloved hands; human skin; mobile ions; secondary ion mass spectrometry analysis; semiconductor fabrication; wafer contamination; wafer-handling protocols; Chemical analysis; Chemical elements; Fingerprint recognition; Humans; Ion beams; Mass spectroscopy; Oils; Silicon; Skin; Surface contamination;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics and Electron Devices, 2006. WMED '06. 2006 IEEE Workshop on
  • Conference_Location
    Boise, ID
  • Print_ISBN
    1-4244-0374-X
  • Type

    conf

  • DOI
    10.1109/WMED.2006.1678296
  • Filename
    1678296