• DocumentCode
    241487
  • Title

    Vertical heterostructure field effect transistor for high performance electronics

  • Author

    Yuan Liu ; Yu Huang ; Xiangfeng Duan

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Univ. of California, Los Angeles, Los Angeles, CA, USA
  • fYear
    2014
  • fDate
    28-31 Oct. 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Graphene has emerged as an exciting material for future electronics and optoelectronics due to its unique electrical, optical and mechanical properties. However, the lack of an intrinsic bandgap in graphene has limited the achievable on-off ratio in transistors using graphene as an active channel. The creation of a transport gap in graphene nanostructures or bilayer graphene can improve the on-off ratio, but often at a severe sacrifice of the deliverable current density. With single atomic thickness, finite density of states and weak screening effect, graphene exhibits a field-tunable work-function and partial electrostatic transparency. It can thus function as an active contact in tunable graphene-semiconductor junction to enable a new generation of vertical device1-5. Here we discuss three different vertical field-effect transistors, which have been recently demonstrated with greatly improved on-off ratio and current density, as well as unique properties such high flexibility, stability and low cost. This could open up a new pathway to graphene electronics and ultra-flexible thin film transistors.
  • Keywords
    current density; field effect transistors; graphene; graphene devices; semiconductor junctions; work function; active channel; active contact; bilayer graphene; current density; electrical properties; field-tunable work-function; finite state density; graphene electronics; graphene nanostructures; high performance electronics; intrinsic bandgap; mechanical properties; on-off ratio; optical properties; optoelectronics; partial electrostatic transparency; single atomic thickness; tunable graphene-semiconductor junction; ultra-flexible thin film transistors; vertical device generation; vertical heterostructure field effect transistor; weak screening effect; Abstracts; Films; Graphene; Logic gates; Silicon; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
  • Conference_Location
    Guilin
  • Print_ISBN
    978-1-4799-3296-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2014.7021165
  • Filename
    7021165