DocumentCode
2416979
Title
Modeling HBT ledge variations for insight into GaAs HBT reliability
Author
Henderson, Tim
Author_Institution
TriQuint Semicond. Texas, Richardson, TX, USA
fYear
2001
fDate
2001
Firstpage
181
Lastpage
202
Abstract
We have modeled the effects of various different extrinsic base passivation ledge parameters - material composition, thickness, width, and spacing from ledge to base contact - to determine the microscopic effects these parameters have on electron-hole recombination density. Obviously, recombination density affects current gain. Additionally, it is well known in the industry that electron-hole recombination at midgap traps associated with crystalline defects drive HBT degradation through reduction of current gain during bias stress. For example, because a passivation ledge eliminates the infinite supply of recombination centers at exposed surfaces, a passivation ledge greatly improves device reliability. Claims that GaInP ledges produce more reliable devices than AlGaAs ledges have also been widely made. Using commercially available HBT simulation software provided by Gateway Modeling, we have investigated the recombination rate in and near the base as a function of various different ledge parameters.
Keywords
III-V semiconductors; electron-hole recombination; gallium arsenide; heterojunction bipolar transistors; passivation; semiconductor device models; semiconductor device reliability; GaAs; GaAs HBT reliability; Gateway Modeling; bias stress; computer simulation; crystalline defect; current gain; electron-hole recombination density; midgap trap; passivation ledge parameters; Composite materials; Crystalline materials; Crystallization; Degradation; Electron microscopy; Electron traps; Gallium arsenide; Heterojunction bipolar transistors; Passivation; Spontaneous emission;
fLanguage
English
Publisher
ieee
Conference_Titel
GaAs Reliability Workshop, 2001. Proceedings
Print_ISBN
0-7908-0066-7
Type
conf
DOI
10.1109/GAASRW.2001.995745
Filename
995745
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