DocumentCode
2421435
Title
Modeling and forecasting of manufacturing variations
Author
Nassif, Sani R.
Author_Institution
Res. Lab., IBM Corp., Austin, TX, USA
fYear
2000
fDate
2000
Firstpage
2
Lastpage
10
Abstract
Manufacturing process variations cause design performance fluctuations and if not accounted for can cause the design to fail to meet performance and/or correctness criteria. These variations are fundamentally different from the unusual contamination-related defects which cause structural changes in the integrated circuit such as shorts or opens between conductors. Using statistical design analysis and optimization techniques, designers can use information about the statistical distribution of electrical parameters to predict and possibly mitigate the impact of manufacturing variability. Key to such analysis efforts, however, is an understanding of the modeling and characterization of parameter variability. In recent technology generations, the emphasis on reduced time to market often results in the simultaneous design of an integrated circuit and the fabrication process in which it will be built. This codesign situation results in the need for variability forecasting. This tutorial starts with a review of the sources and impacts of parameter variability, stressing the difference between intra-die and inter-die variations. The tutorial then discusses existing methods for statistical parameter characterization, and closes with some trends and forecasts for variability in the coming technology nodes
Keywords
fluctuations; integrated circuit design; integrated circuit manufacture; integrated circuit modelling; integrated circuit reliability; optimisation; semiconductor process modelling; correctness criteria; design performance fluctuations; electrical parameters; forecasting; integrated circuit; inter-die variations; intra-die variations; manufacturing process variations; manufacturing variability; manufacturing variations; modelling; optimization techniques; parameter variability; review; statistical design analysis; statistical distribution; variability forecasting; Conductors; Design optimization; Fluctuations; Information analysis; Integrated circuit technology; Manufacturing processes; Predictive models; Process design; Statistical distributions; Virtual manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Statistical Metrology, 2000 5th International Workshop on
Conference_Location
Honolulu, HI
Print_ISBN
0-7803-5896-1
Type
conf
DOI
10.1109/IWSTM.2000.869299
Filename
869299
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