• DocumentCode
    2430567
  • Title

    A novel 80V-class HV-MOS platform technology featuring high-side capable 30V-gate-voltage drift-NMOSFET and a trigger controllable ESD protection BJT

  • Author

    Fujii, Hiroki ; Komatsu, Shinichi ; Sato, Masaharu ; Ichikawa, Toshihiko

  • Author_Institution
    Adv. Device Dev. Div., NEC Electron. Corp., Sagamihara, Japan
  • fYear
    2009
  • fDate
    14-18 June 2009
  • Firstpage
    323
  • Lastpage
    326
  • Abstract
    An 80 V-class high voltage (HV) MOS platform integrating two types of 80 V-class novel structure devices, a high-side capable 30 V-gate-voltage drift-NMOSFET and an ESD protection BJT, is described. The 30 V-gate-voltage drift NMOSFET features a stacked source-side structure consisting of LOCOS, an extended source region, and a waved p+ stopper, enabling both off-state and on-state drain breakdown voltage to surpass 80 V. Despite its high gate voltage endurance of over 30 V, the specific on-resistance (Rsp) reaches as low as 275 mohm*mm2. The ESD protection BJT features a buffer base region, enabling the trigger voltage to surpass 100 V and the ESD endurance voltage to reach 4 kV-HBM. The trigger voltage can be controlled from 78 to 102 V by changing the buffer base size. These devices can be integrated with only one additional mask step and do not sacrifice the excellent performance of the other high and low voltage devices.
  • Keywords
    electrostatic discharge; power MOSFET; semiconductor device breakdown; BJT; ESD protection; LOCOS; buffer base region; drift-NMOSFET; endurance voltage; extended source region; high voltage MOS platform; off-state drain breakdown voltage; on-state drain breakdown voltage; specific on-resistance; stacked source-side structure; trigger voltage; voltage 30 V; voltage 78 V to 102 V; waved p+ stopper; Batteries; Bidirectional control; Driver circuits; Electrostatic discharge; Low voltage; MOSFET circuits; National electric code; Protection; Size control; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's, 2009. ISPSD 2009. 21st International Symposium on
  • Conference_Location
    Barcelona
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4244-3525-8
  • Electronic_ISBN
    1943-653X
  • Type

    conf

  • DOI
    10.1109/ISPSD.2009.5158067
  • Filename
    5158067