DocumentCode
2430567
Title
A novel 80V-class HV-MOS platform technology featuring high-side capable 30V-gate-voltage drift-NMOSFET and a trigger controllable ESD protection BJT
Author
Fujii, Hiroki ; Komatsu, Shinichi ; Sato, Masaharu ; Ichikawa, Toshihiko
Author_Institution
Adv. Device Dev. Div., NEC Electron. Corp., Sagamihara, Japan
fYear
2009
fDate
14-18 June 2009
Firstpage
323
Lastpage
326
Abstract
An 80 V-class high voltage (HV) MOS platform integrating two types of 80 V-class novel structure devices, a high-side capable 30 V-gate-voltage drift-NMOSFET and an ESD protection BJT, is described. The 30 V-gate-voltage drift NMOSFET features a stacked source-side structure consisting of LOCOS, an extended source region, and a waved p+ stopper, enabling both off-state and on-state drain breakdown voltage to surpass 80 V. Despite its high gate voltage endurance of over 30 V, the specific on-resistance (Rsp) reaches as low as 275 mohm*mm2. The ESD protection BJT features a buffer base region, enabling the trigger voltage to surpass 100 V and the ESD endurance voltage to reach 4 kV-HBM. The trigger voltage can be controlled from 78 to 102 V by changing the buffer base size. These devices can be integrated with only one additional mask step and do not sacrifice the excellent performance of the other high and low voltage devices.
Keywords
electrostatic discharge; power MOSFET; semiconductor device breakdown; BJT; ESD protection; LOCOS; buffer base region; drift-NMOSFET; endurance voltage; extended source region; high voltage MOS platform; off-state drain breakdown voltage; on-state drain breakdown voltage; specific on-resistance; stacked source-side structure; trigger voltage; voltage 30 V; voltage 78 V to 102 V; waved p+ stopper; Batteries; Bidirectional control; Driver circuits; Electrostatic discharge; Low voltage; MOSFET circuits; National electric code; Protection; Size control; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices & IC's, 2009. ISPSD 2009. 21st International Symposium on
Conference_Location
Barcelona
ISSN
1943-653X
Print_ISBN
978-1-4244-3525-8
Electronic_ISBN
1943-653X
Type
conf
DOI
10.1109/ISPSD.2009.5158067
Filename
5158067
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