DocumentCode
2434791
Title
High performance MEMS spiral inductors
Author
Fang, Dong-Ming ; Yuan, Quan ; Li, Xiu-Han ; Zhang, Hai-Xia ; Zhou, Yong ; Zhao, Xiao-Lin
Author_Institution
Inst. of Microelectron., Peking Univ., Beijing, China
fYear
2010
fDate
20-23 Jan. 2010
Firstpage
1033
Lastpage
1035
Abstract
In this paper, fabrication and performance of RF MEMS planar spiral inductors is presented. The fabrication process is simple, using surface micromachined technology with three masks. Two types of spiral inductor were fabricated and the measured results showed that the spiral inductors had high performance at high frequency. The maximum quality of the spiral inductor-Type A is 15.8 at 1.4 GHz with inductance of 4.61 nH. The maximum quality of the spiral inductor-Type B is 19.7 at 4.1 GHz with inductance of 1.40 nH.
Keywords
inductors; micromachining; micromechanical devices; RF MEMS planar spiral inductors; frequency 1.4 GHz; frequency 4.1 GHz; spiral inductor-Type A; spiral inductor-Type B; surface micromachined technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
Conference_Location
Xiamen
Print_ISBN
978-1-4244-6543-9
Type
conf
DOI
10.1109/NEMS.2010.5592582
Filename
5592582
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