Design and realisation of apparatus to study capillary discharge in gas

Summary form only given. We have generated Xe plasma in dense plasma focus device of coaxial electrode for extreme ultraviolet lithography (EUVL) and investigated an emitted visible light for electro-optical plasma diagnostics. We have applied an input voltage 4.5 kV to the capacitor bank and the diode chamber have been filled with Xe gas of pressure 40 mTorr. The inner surface of cylindrical cathode have been attatched by an acrylic insulator. The electron temperature and density of the coaxial plasma focus were obtained by the optical emission spectroscopy (OES). The electron temperature has been measured by the two relative line intensity and Boltzmann plot. In case of electron density, it has been observed by the Stark broadening method. This experiment shows that the electron temperature and density characteristics for a focused plasma can be influenced by the acrylic insulator length installed onto the cathode surface and materials of anode. The EUV emission signal whose wavelength is about 6-16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD).