Eletronical and optical characteristics of atmospheric pressure plasma enhanced chemical vapor deposition (APPECVD) system

Author

Oksuz, Lutfi ; Gulec, Ali ; Ozaltin, K. ; Akkaya, Kadir ; Erkmen, Gokhan ; Uygun, Aysedul

Author_Institution

Dept. of Phys., Suleyman Demirel Univ., Isparta

fYear

2008

fDate

15-19 June 2008

Firstpage

1

Lastpage

1

Abstract

A dielectric barrier atmospheric pressure plasma discharge system with 13,56 MHz rf power supply and matching unit is built for plasma enhanced chemical vapor and composite deposition purposes. Plasma system is optimized for maximum power transfer by homemade matching circuit and uniform glow discharge is obtained with helium and argon flow. The optical, invasive electrical probe and noninvasive electrical characteristics are examined with and without monomer flow to the system. Time resolved ICCD pictures and electrical characteristics will be given with and without of monomers introduced to the system for polymerization.

Keywords

plasma CVD; polymerisation; APPECVD; atmospheric pressure plasma enhanced chemical vapor deposition; composite deposition purposes; dielectric barrier atmospheric pressure plasma discharge system; electrical properties; frequency 13.56 MHz; noninvasive electrical characteristics; optical properties; polymerization; time resolved ICCD pictures; Atmospheric-pressure plasmas; Chemical vapor deposition; Circuits; Dielectrics; Electric variables; Glow discharges; Helium; Plasma chemistry; Plasma properties; Power supplies;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on

Conference_Location

Karlsruhe

ISSN

0730-9244

Print_ISBN

978-1-4244-1929-6

Electronic_ISBN

0730-9244

Type

conf

DOI

10.1109/PLASMA.2008.4590732

Filename

4590732