• DocumentCode
    2438719
  • Title

    Polycrystalline CVD diamond-a new dielectric material for microwave electronics

  • Author

    Ralchenko, V.G. ; Konov, V.I. ; Parshin, V.V. ; Garin, B.M. ; Heidinger, R.

  • Author_Institution
    Natural Sci. Center of Gen. Phys. Inst., Russian Acad. of Sci., Moscow, Russia
  • fYear
    2003
  • fDate
    8-12 Sept. 2003
  • Firstpage
    547
  • Lastpage
    548
  • Abstract
    Properties of polycrystalline diamond wafers produced by chemical vapor deposition (CVD) are described which show their importance for applications in microwave electronics. Today CVD diamonds become an engineering material whose unique thermal and electrophysical parameters make it very promising for a new generation of microwave devices.
  • Keywords
    diamond; dielectric materials; microwave devices; plasma CVD; CVD; chemical vapor deposition; electrophysical parameter; engineering material; microwave electronics; polycrystalline diamond wafer; Chemical vapor deposition; Crystallization; Dielectric materials; Hidden Markov models; Microwave technology; Organizing; Plasmas; Pulse width modulation; Rough surfaces; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Telecommunication Technology, 2003. CriMiCo 2003. 13th International Crimean Conference
  • Conference_Location
    Sevastopol, Crimea, Ukraine
  • Print_ISBN
    966-7968-26-X
  • Type

    conf

  • DOI
    10.1109/CRMICO.2003.158928
  • Filename
    1256614