DocumentCode
2441107
Title
2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479)
fYear
2000
fDate
22-24 May 2000
Abstract
The following topics were dealt with: charging damage; gate oxides; SOI technology; CVD processing; electron shading; front-end processing; multilevel interconnects; 300 mm technology; copper and low-κ dielectrics; dielectric thin films; antenna test structures; interlevel dielectrics.
Keywords
plasma materials processing; semiconductor technology; antenna test structures; electron shading; plasma process-induced damage; semiconductor manufacturing; surface charging;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 2000 5th International Symposium on
Conference_Location
Santa Clara, CA, USA
Print_ISBN
0-9651577-4-1
Type
conf
DOI
10.1109/PPID.2000.870552
Filename
870552
Link To Document