• DocumentCode
    2445214
  • Title

    Pulsed low frequency plasma source

  • Author

    Teske, Christian ; Jacoby, J.

  • Author_Institution
    Johann Wolfgang Goethe Univ., Frankfurt
  • fYear
    2008
  • fDate
    15-19 June 2008
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    An inductively coupled pulsed plasma source with an operating frequency of 29 kHz is under investigation at the Institute for Applied Physics in Frankfurt. The experimental setup consists of a series resonance circuit with a load capacitance of 12 muF and a large diameter induction coil surrounding a spherical discharge vessel. During discharge generation pulse coil currents reached a maximum value of 10 kA with current rise times of 2 kA/mus while achieving an energy coupling efficiency of 80% between the driving circuit and the plasma. Pulse power peak values reached more than 1 MW. The current rise times required for plasma initiation were measured as a function of the applied gas pressure for Argon, Hydrogen, Helium and Nitrogen. A complete discharge sequence over a period of 120 mus was documented using a fast camera system. Moreover the spectroscopic diagnostic revealed a high fraction of ionized particles and an emission spectrum in the near UV domain. Electron densities reached peak values of 1021 m-3.
  • Keywords
    argon; discharges (electric); helium; hydrogen; nitrogen; plasma density; plasma diagnostics; plasma sources; Ar; Frankfurt; H; He; Institute for Applied Physics; N; applied gas pressure; capacitance 12 muF; current rise time; discharge sequence; frequency 29 kHz; inductively coupled pulsed plasma source; ionized particle fraction; large diameter induction coil; near UV emission spectrum; plasma electron density; plasma initiation; pulsed low frequency plasma source; series resonance circuit; spectroscopic diagnostics; spherical discharge vessel; Coils; Coupling circuits; Fault location; Frequency; Physics; Plasma measurements; Plasma sources; Pulse measurements; RLC circuits; Resonance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
  • Conference_Location
    Karlsruhe
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-1929-6
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2008.4591196
  • Filename
    4591196