• DocumentCode
    2452311
  • Title

    Advanced carrier density enhancement technologies in insulated gate bipolar transistors

  • Author

    Hsu, Wesley Chih-Wei ; Udrea, Florin ; Chen, Ho-Tai ; Lin, Wei-Chieh

  • Author_Institution
    Dept. of Eng., Univ. of Cambridge, Cambridge, UK
  • Volume
    2
  • fYear
    2009
  • fDate
    12-14 Oct. 2009
  • Firstpage
    393
  • Lastpage
    396
  • Abstract
    Continuous efforts have been made to improve the IGBT performance, especially in terms of the trade-off between the on-state voltages and turn-off energy losses. Recently the carrier density enhancement (CDE) technologies, which aim at increasing the carrier densities near the emitter/cathode side of the IGBTs, are of great interest to the industry. In this paper, an insight introduction of the state-of-the-art CDE technologies is provided. In addition, a novel dual-gate trench IGBT which utilises an embedded low-gain PNP and thyristor to achieve an ultra-low on-state voltage without deteriorating the switching speed is presented.
  • Keywords
    carrier density; insulated gate bipolar transistors; thyristors; IGBT performance; advanced carrier density enhancement technologies; dual-gate trench IGBT; embedded low-gain PNP; emitter/cathode side; insulated gate bipolar transistors; switching speed; thyristor; turn-off energy losses; ultra-low on-state voltage; Anodes; Cathodes; Charge carrier density; Charge carrier processes; Conductivity; Energy loss; Insulated gate bipolar transistors; MOSFET circuits; Thyristors; Voltage; IGBT; carrier density enhancement (CDE);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference, 2009. CAS 2009. International
  • Conference_Location
    Sinaia
  • ISSN
    1545-827X
  • Print_ISBN
    978-1-4244-4413-7
  • Type

    conf

  • DOI
    10.1109/SMICND.2009.5336697
  • Filename
    5336697