DocumentCode
2452311
Title
Advanced carrier density enhancement technologies in insulated gate bipolar transistors
Author
Hsu, Wesley Chih-Wei ; Udrea, Florin ; Chen, Ho-Tai ; Lin, Wei-Chieh
Author_Institution
Dept. of Eng., Univ. of Cambridge, Cambridge, UK
Volume
2
fYear
2009
fDate
12-14 Oct. 2009
Firstpage
393
Lastpage
396
Abstract
Continuous efforts have been made to improve the IGBT performance, especially in terms of the trade-off between the on-state voltages and turn-off energy losses. Recently the carrier density enhancement (CDE) technologies, which aim at increasing the carrier densities near the emitter/cathode side of the IGBTs, are of great interest to the industry. In this paper, an insight introduction of the state-of-the-art CDE technologies is provided. In addition, a novel dual-gate trench IGBT which utilises an embedded low-gain PNP and thyristor to achieve an ultra-low on-state voltage without deteriorating the switching speed is presented.
Keywords
carrier density; insulated gate bipolar transistors; thyristors; IGBT performance; advanced carrier density enhancement technologies; dual-gate trench IGBT; embedded low-gain PNP; emitter/cathode side; insulated gate bipolar transistors; switching speed; thyristor; turn-off energy losses; ultra-low on-state voltage; Anodes; Cathodes; Charge carrier density; Charge carrier processes; Conductivity; Energy loss; Insulated gate bipolar transistors; MOSFET circuits; Thyristors; Voltage; IGBT; carrier density enhancement (CDE);
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 2009. CAS 2009. International
Conference_Location
Sinaia
ISSN
1545-827X
Print_ISBN
978-1-4244-4413-7
Type
conf
DOI
10.1109/SMICND.2009.5336697
Filename
5336697
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