• DocumentCode
    245546
  • Title

    A volume diagnosis method for identifying systematic faults in lower-yield wafer occurring during mass production

  • Author

    Ishida, Tomoyuki ; Nitta, Isamu ; Banno, Koji ; Kanazawa, Yuji

  • Author_Institution
    Fujitsu Labs. Ltd., Kawasaki, Japan
  • fYear
    2014
  • fDate
    20-23 Jan. 2014
  • Firstpage
    670
  • Lastpage
    675
  • Abstract
    This work focuses on volume diagnosis for identifying systematic faults in lower-yield wafers, whose yields are lower than baseline level due to systematic faults during mass production. We develop a model-based volume diagnosis method. To diagnose accurately using the fail data with one lower-yield wafer, we apply modeling techniques for handling pseudo-faults and random faults in the fail data. Experimental results show our method´s efficiency; we succeeded in identifying the failure layer for 20/22 data sets with actual lower-yield wafers.
  • Keywords
    fault diagnosis; mass production; semiconductor technology; handling pseudofaults; lower-yield wafer; mass production; model-based volume diagnosis method; modeling technique; random faults; systematic fault identification; Circuit faults; Fault diagnosis; Feature extraction; Integrated circuit modeling; Layout; Systematics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference (ASP-DAC), 2014 19th Asia and South Pacific
  • Conference_Location
    Singapore
  • Type

    conf

  • DOI
    10.1109/ASPDAC.2014.6742968
  • Filename
    6742968