• DocumentCode
    2470415
  • Title

    Sputtering Dose Control of Ion Mill Processing

  • Author

    Raschke, Curt ; Wilde, Patrick ; Hill, Cynthia

  • fYear
    1987
  • fDate
    14-16 Oct. 1987
  • Firstpage
    193
  • Lastpage
    196
  • Keywords
    Computerized monitoring; Fabrication; Gratings; Ion beams; Milling machines; Optical films; Proportional control; Sputter etching; Sputtering; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    IEEE 1987 Ultrasonics Symposium
  • Conference_Location
    Denver, Colorado, USA
  • Type

    conf

  • DOI
    10.1109/ULTSYM.1987.198952
  • Filename
    1535892