DocumentCode
2470500
Title
Interdiffusion in GaAs-AlGaAs quantum wells using anodic and thermal oxides of GaAs
Author
Yuan, S. ; Li, G. ; Cohen, R.M. ; Fu, L. ; Tan, H.H. ; Johnston, M.B. ; Dao, L.V. ; Gal, M. ; Jagadish, C.
Author_Institution
Res. Sch. of Phys. Sci., Australian Nat. Univ., Canberra, ACT, Australia
Volume
2
fYear
1998
fDate
3-4 Dec 1998
Firstpage
36
Abstract
Interdiffusion in quantum wells (QW) is of current interest for optoelectronic device applications. Interdiffusion between quantum well and barriers allow the modification of quantum well shapes which in turn leads to changes in subband energies in the conduction and valence bands. This allows to modify band gap energy, absorption coefficient and refractive index. Monolithic integration of various optoelectronic devices such as lasers, modulators, detectors and waveguides can be achieved by selective area quantum well intermixing/interdiffusion
Keywords
III-V semiconductors; aluminium compounds; chemical interdiffusion; gallium arsenide; integrated optoelectronics; optoelectronic devices; semiconductor quantum wells; GaAs-AlGaAs; GaAs-AlGaAs quantum wells; absorption coefficient; anodic oxides; band gap energy; conduction bands; interdiffusion; optoelectronic device applications; optoelectronic devices; quantum well intermixing; quantum well shapes; refractive index; subband energies; thermal oxides; valence bands; Cities and towns; Gallium arsenide; Impurities; Materials science and technology; Optoelectronic devices; Oxidation; Photonic band gap; Rapid thermal annealing; Substrates; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society Annual Meeting, 1998. LEOS '98. IEEE
Conference_Location
Orlando, FL
Print_ISBN
0-7803-4947-4
Type
conf
DOI
10.1109/LEOS.1998.739448
Filename
739448
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