• DocumentCode
    2470500
  • Title

    Interdiffusion in GaAs-AlGaAs quantum wells using anodic and thermal oxides of GaAs

  • Author

    Yuan, S. ; Li, G. ; Cohen, R.M. ; Fu, L. ; Tan, H.H. ; Johnston, M.B. ; Dao, L.V. ; Gal, M. ; Jagadish, C.

  • Author_Institution
    Res. Sch. of Phys. Sci., Australian Nat. Univ., Canberra, ACT, Australia
  • Volume
    2
  • fYear
    1998
  • fDate
    3-4 Dec 1998
  • Firstpage
    36
  • Abstract
    Interdiffusion in quantum wells (QW) is of current interest for optoelectronic device applications. Interdiffusion between quantum well and barriers allow the modification of quantum well shapes which in turn leads to changes in subband energies in the conduction and valence bands. This allows to modify band gap energy, absorption coefficient and refractive index. Monolithic integration of various optoelectronic devices such as lasers, modulators, detectors and waveguides can be achieved by selective area quantum well intermixing/interdiffusion
  • Keywords
    III-V semiconductors; aluminium compounds; chemical interdiffusion; gallium arsenide; integrated optoelectronics; optoelectronic devices; semiconductor quantum wells; GaAs-AlGaAs; GaAs-AlGaAs quantum wells; absorption coefficient; anodic oxides; band gap energy; conduction bands; interdiffusion; optoelectronic device applications; optoelectronic devices; quantum well intermixing; quantum well shapes; refractive index; subband energies; thermal oxides; valence bands; Cities and towns; Gallium arsenide; Impurities; Materials science and technology; Optoelectronic devices; Oxidation; Photonic band gap; Rapid thermal annealing; Substrates; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society Annual Meeting, 1998. LEOS '98. IEEE
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    0-7803-4947-4
  • Type

    conf

  • DOI
    10.1109/LEOS.1998.739448
  • Filename
    739448