DocumentCode
2472838
Title
Optical gain from the direct gap transition of Ge-on-Si at room temperature
Author
Liu, Jifeng ; Sun, Xiaochen ; Kimerling, Lionel C. ; Michel, Jurgen
Author_Institution
Microphotonics Center, Massachusetts Inst. of Technol., Cambridge, MA, USA
fYear
2009
fDate
9-11 Sept. 2009
Firstpage
262
Lastpage
264
Abstract
We report direct band gap optical gain of tensile strained n+ epitaxial Ge-on-Si at room temperature, which confirms that band-engineered Ge-on-Si is a promising gain medium for monolithic optical amplifiers and lasers on Si.
Keywords
elemental semiconductors; energy gap; germanium; optical materials; optical saturable absorption; semiconductor doping; semiconductor epitaxial layers; Ge; Si; band-engineered Ge-on-Si; direct band gap; direct gap transition; laser gain medium; monolithic optical amplifiers; n-type doping; optical bleaching; optical gain; room temperature transition; temperature 293 K to 298 K; tensile strained n+ epitaxial Ge-on-Si; Doping; Optical buffering; Optical films; Optical pumping; Optical waveguides; Photonic band gap; Probes; Stimulated emission; Temperature; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
1949-2081
Print_ISBN
978-1-4244-4402-1
Electronic_ISBN
1949-2081
Type
conf
DOI
10.1109/GROUP4.2009.5338364
Filename
5338364
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