• DocumentCode
    2476651
  • Title

    P1H-3 Epitaxial Pb(Zr0.2Ti0.8)O3 Thin Layers for the Fabrication of Radio-Frequency Elastic Wave Transducers

  • Author

    Salut, R. ; Daniau, W. ; Ballandras, S. ; Gariglio, S. ; Triscone, G. ; Triscone, J.M.

  • Author_Institution
    UMR 6174CNRS-UFC-ENSMM-UTBM, Besancon
  • fYear
    2007
  • fDate
    28-31 Oct. 2007
  • Firstpage
    1421
  • Lastpage
    1424
  • Abstract
    In this paper, we investigate the capability of epitaxial Pb(Zr0.2Ti0.8)O3 thin films for RF applications. Films have been grown on insulating (001) SrTiO3 single crystal substrates by off-axis magnetron sputtering in 180 mTorr of an oxygen/argon mixture at a substrate temperature of 510degC. Contrary to PZT layers obtained by conventional sputtering or sol-gel techniques, still exhibiting granular structures, the films are extremely smooth and exhibit finite size effects around the (001) reflection peaks, allowing the measurement of the thickness (150 nm and 200 nm in this case). Curie temperature of the films is measured close to 680degC, which is much higher than standard PZT and allows for operating on an extended temperature range. Focused ion beam (FIB) etching techniques have been used to fabricate standard inter-digital transducers (IDTs). Electromechanical coupling in the vicinity of 3% with Q factors near 100 was found in the frequency range 3.5-5 GHz.
  • Keywords
    acoustic microwave devices; electromechanical effects; epitaxial layers; focused ion beam technology; interdigital transducers; lead compounds; sputter etching; strontium compounds; surface acoustic wave resonators; Curie temperature; FIB etching techniques; Pb(Zr0.2Ti0.8)O3; RF applications; SAW resonator fabrication; SrTiO3; electromechanical coupling; epitaxial thin layers; finite size effects; focused ion beam etching techniques; frequency 3.5 GHz to 5 GHz; high frequency SAW devices; inter-digital transducers; off-axis magnetron sputtering; pressure 180 mtorr; radio-frequency elastic wave transducers; size 150 nm; size 200 nm; temperature 510 C; Argon; Fabrication; Gas insulation; Optical films; Optical reflection; Radio frequency; Sputtering; Substrates; Temperature distribution; Transducers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium, 2007. IEEE
  • Conference_Location
    New York, NY
  • ISSN
    1051-0117
  • Print_ISBN
    978-1-4244-1384-3
  • Electronic_ISBN
    1051-0117
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2007.357
  • Filename
    4409930