Identification of macroscopic process observables for thin-film growth

We identify a minimum set of "coarse" spatially invariant parameters that accurately describe the dominant behavior of the deposition surface during thin-film growth under adsorption and surface diffusion. We demonstrate, through kMC simulations, that different deposition surfaces constructed through a stochastic reconstruction procedure, with identical values for these parameters, exhibit approximately identical "coarse" dynamic behavior. These parameters can be subsequently employed to develop low-order state-space models for controller synthesis and optimization as an alternative to computationally expensive kMC simulations