• DocumentCode
    2480086
  • Title

    Dopant level freeze-out in 6H-SiC Schottky diodes and junctions

  • Author

    Raynaud, C. ; Guillot, G.

  • Author_Institution
    Lab. de Physique de la Matiere, INSA de Lyon, Villeurbanne, France
  • fYear
    1996
  • fDate
    29 Apr-3 May 1996
  • Firstpage
    227
  • Lastpage
    230
  • Abstract
    Admittance spectroscopy is shown to be a very convenient tool for analysing majority carrier traps. We have studied by this technique different n- and p-type 6H-SiC Schottky diodes and pn junctions for different net doping levels, N-type and p-type doping are obtained by nitrogen and aluminum respectively, For nitrogen, we have detected two energy levels at Ec-82 meV and Ec-137 meV, which are respectively attributed to hexagonal and cubic sites in 6H-SiC. For aluminum, we have generally detected a rather large variation in the measured activation energy. This variation is supposed to depend on the net doping level, that is, on the compensation ratio
  • Keywords
    Schottky diodes; aluminium; impurity states; nitrogen; p-n junctions; semiconductor doping; semiconductor epitaxial layers; semiconductor materials; silicon compounds; wide band gap semiconductors; 6H-SiC; Schottky diodes; SiC:Al; SiC:N; activation energy; admittance spectroscopy; compensation ratio; dopant level freeze-out; doping level; majority carrier traps; n-type doping; p-type doping; pn junctions; Admittance; Aluminum; Doping; Energy measurement; Energy states; Light emitting diodes; Nitrogen; Schottky diodes; Silicon carbide; Spectroscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
  • Conference_Location
    Toulouse
  • Print_ISBN
    0-7803-3179-6
  • Type

    conf

  • DOI
    10.1109/SIM.1996.571082
  • Filename
    571082