• DocumentCode
    2482117
  • Title

    Why are low-temperature MBE grown semiconductors important for an all-solid-state ultrafast laser technology?

  • Author

    Keller, U.

  • Author_Institution
    Inst. for Quantum Electron., Swiss Federal Inst. of Technol., Zurich, Switzerland
  • fYear
    1996
  • fDate
    29 Apr-3 May 1996
  • Firstpage
    317
  • Lastpage
    320
  • Abstract
    We generate pulses from nanoseconds to 10 fs by varying the semiconductor saturable absorber and laser cavity design. In the long pulse regime with pulses as short as 180 ps, we rely on passive Q-switching. In the picosecond regime, we use the fast saturable absorber modelocking technique, and in the femtosecond regime, the semiconductor saturable absorber stabilizes soliton modelocking. In all cases, we benefit from the large design freedom of the antiresonant Fabry-Perot saturable absorber (A-FPSA) concept using low-temperature MBE growth to artificially adjust the physical parameters such as recovery times, saturation fluence, saturation intensity, insertion loss and modulation depth
  • Keywords
    Fabry-Perot resonators; Q-switching; high-speed optical techniques; laser cavity resonators; laser mode locking; molecular beam epitaxial growth; optical losses; optical modulation; optical saturable absorption; optical solitons; semiconductor growth; semiconductor lasers; 1 ns to 10 fs; 180 ps; all-solid-state ultrafast laser technology; antiresonant Fabry-Perot saturable absorber; fast saturable absorber modelocking technique; femtosecond regime; insertion loss; laser cavity design; long pulse regime; low-temperature MBE grown semiconductors; low-temperature MBE growth; modulation depth; nanoseconds; passive Q-switching; picosecond regime; pulses; recovery times; saturation fluence; saturation intensity; semiconductor saturable absorber; soliton modelocking; Fabry-Perot; Laser modes; Mirrors; Optical pulse generation; Semiconductor lasers; Solid lasers; Solid modeling; Solitons; Tellurium; Ultrafast optics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
  • Conference_Location
    Toulouse
  • Print_ISBN
    0-7803-3179-6
  • Type

    conf

  • DOI
    10.1109/SIM.1996.571109
  • Filename
    571109