• DocumentCode
    2502892
  • Title

    Formation of atomically sharp silicon needles (for vacuum microelectronics)

  • Author

    Marcus, R.B. ; Ravi, T.S. ; Gmitter, T. ; Chin, K. ; Liu, D. ; Orvis, W.J. ; Ciarlo, D.R. ; Hunt, C.E. ; Trujillo, J.

  • Author_Institution
    Bellcore, Red Bank, NJ, USA
  • fYear
    1989
  • fDate
    3-6 Dec. 1989
  • Firstpage
    884
  • Lastpage
    886
  • Abstract
    Summary form only given. An effort was made to exploit a known oxidation inhibition of silicon at regions of high curvature in order to develop emitter tips significantly sharper than those obtained previously. While this idea has already been proposed and used, the present study is the first to examine oxidation of conical silicon tips in some detail at high resolution. The results of this study are the development of a method for preparing uniform silicon tips with tip radii less than 1.0 nm and the clear demonstration of oxidation inhibition at a region of high and complex curvature. TEM images of two tips are shown at different magnifications. Fringes of the Si
  • Keywords
    electron field emission; elemental semiconductors; oxidation; silicon; vacuum microelectronics; Si; TEM images; complex curvature; conical silicon tips; electron scattering; emitter tips; oxidation inhibition; tip diameter; tip radii; Atomic measurements; Electron emission; Electron guns; Microelectronics; Needles; Oxidation; Physics; Silicon; Springs; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1989. IEDM '89. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0817-4
  • Type

    conf

  • DOI
    10.1109/IEDM.1989.74195
  • Filename
    74195