DocumentCode
2514570
Title
Lateral asymmetry in silicon MOSFETs: A new path to improve their microwave noise performance
Author
Danneville, F. ; Lim, T.C. ; Dambrine, G.
Author_Institution
CNRS, IEMN, Villeneuve-d´´Ascq
fYear
2008
fDate
21-24 Nov. 2008
Firstpage
297
Lastpage
298
Abstract
Field effect transistors feature outstanding noise performance, and one of the fundamental reason being that the (input) gate noise is partially subtracted to the (output) drain noise. If III-V HEMTs strongly take benefit of this unique property, this is not the case for classical Si MOSFETs owing symmetric channel (SY-MOSFETs). In order to overcome this limitation, a new path to improve microwave noise performance of Si MOSFETs -through the use of laterally asymmetric channel- is proposed in this paper. The strong interest of these ldquoLAC-MOSFETsrdquo for low noise/low power applications is shown through a benchmarking of their noise properties/performances with SY-MOSFET and III-V pHEMTs.
Keywords
MOSFET; elemental semiconductors; low-power electronics; microwave field effect transistors; semiconductor device noise; silicon; Si; field effect transistor; lateral asymmetric channel; low noise applications; low power applications; microwave noise performance; silicon MOSFET; CMOS technology; Capacitance; FETs; MOSFETs; Noise figure; Noise measurement; Optimized production technology; Performance gain; Radio frequency; Silicon; Intrinsic noise correlation coefficient (C); laterally asymmetric channel (LAC-MOSFET); minimum noise figure (NFMIN);
fLanguage
English
Publisher
ieee
Conference_Titel
Recent Advances in Microwave Theory and Applications, 2008. MICROWAVE 2008. International Conference on
Conference_Location
Jaipur
Print_ISBN
978-1-4244-2690-4
Electronic_ISBN
978-1-4244-2691-1
Type
conf
DOI
10.1109/AMTA.2008.4763246
Filename
4763246
Link To Document