• DocumentCode
    2514570
  • Title

    Lateral asymmetry in silicon MOSFETs: A new path to improve their microwave noise performance

  • Author

    Danneville, F. ; Lim, T.C. ; Dambrine, G.

  • Author_Institution
    CNRS, IEMN, Villeneuve-d´´Ascq
  • fYear
    2008
  • fDate
    21-24 Nov. 2008
  • Firstpage
    297
  • Lastpage
    298
  • Abstract
    Field effect transistors feature outstanding noise performance, and one of the fundamental reason being that the (input) gate noise is partially subtracted to the (output) drain noise. If III-V HEMTs strongly take benefit of this unique property, this is not the case for classical Si MOSFETs owing symmetric channel (SY-MOSFETs). In order to overcome this limitation, a new path to improve microwave noise performance of Si MOSFETs -through the use of laterally asymmetric channel- is proposed in this paper. The strong interest of these ldquoLAC-MOSFETsrdquo for low noise/low power applications is shown through a benchmarking of their noise properties/performances with SY-MOSFET and III-V pHEMTs.
  • Keywords
    MOSFET; elemental semiconductors; low-power electronics; microwave field effect transistors; semiconductor device noise; silicon; Si; field effect transistor; lateral asymmetric channel; low noise applications; low power applications; microwave noise performance; silicon MOSFET; CMOS technology; Capacitance; FETs; MOSFETs; Noise figure; Noise measurement; Optimized production technology; Performance gain; Radio frequency; Silicon; Intrinsic noise correlation coefficient (C); laterally asymmetric channel (LAC-MOSFET); minimum noise figure (NFMIN);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Recent Advances in Microwave Theory and Applications, 2008. MICROWAVE 2008. International Conference on
  • Conference_Location
    Jaipur
  • Print_ISBN
    978-1-4244-2690-4
  • Electronic_ISBN
    978-1-4244-2691-1
  • Type

    conf

  • DOI
    10.1109/AMTA.2008.4763246
  • Filename
    4763246