DocumentCode
2519755
Title
Equivalent reactance model on shielding effectiveness analysis of high-transparent ring metallic mesh with submillimeter period and micrometer linewidth
Author
Lu Zhengang ; Zhigang, Fan ; Jin Peng ; Tan Jiubin
Author_Institution
Postdoctoral Res. Station of Opt. Eng., Harbin Inst. of Technol., Harbin, China
fYear
2010
fDate
3-6 Dec. 2010
Firstpage
1
Lastpage
4
Abstract
In order to accurately and efficiently analyze the shielding effectiveness of high-transparent ring metallic mesh with submillimeter period and micrometer linewidth, an equivalent reactance model for the ring metallic mesh is proposed by using the equivalent reactance of its external and internal square meshes as well as two proportional factors. A ring metallic mesh sample was fabricated by UV-lithography and its shielding effectiveness was measured at 0° and 30° incident S-polarization microwaves. Experimental results agree well with simulated results, which proves the correctness of the equivalent reactance model proposed. So the equivalent reactance model can be used in the calculation and analysis of shielding effectiveness of high-transparent ring metallic mesh.
Keywords
electric reactance; electromagnetic shielding; metals; ultraviolet lithography; S-polarization microwaves; UV lithography; equivalent reactance model; high-transparent ring metallic mesh; micrometer linewidth; shielding effectiveness analysis; submillimeter period; Analytical models; Equivalent circuits; Microwave filters; Microwave measurements; Optical device fabrication; Optical diffraction; Optical filters; UV-lithography; electromagnetic shielding effectiveness; equivalent reactance; ring metallic mesh;
fLanguage
English
Publisher
ieee
Conference_Titel
Advances in Optoelectronics and Micro/Nano-Optics (AOM), 2010 OSA-IEEE-COS
Conference_Location
Guangzhou
Print_ISBN
978-1-4244-8393-8
Electronic_ISBN
978-1-4244-8392-1
Type
conf
DOI
10.1109/AOM.2010.5713595
Filename
5713595
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