• DocumentCode
    2520053
  • Title

    A subthreshold SRAM cell tolerant to random dopant fluctuations

  • Author

    Mehr, Amir Reza Ahmadi ; Madadi, Iman ; Afzali-Kusha, Ali

  • Author_Institution
    Nanoelectron. Center of Excellence, Univ. of Tehran, Tehran, Iran
  • fYear
    2010
  • fDate
    15-17 Dec. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, we propose a subthreshold SRAM cell tolerant to random dopant fluctuations. The proposed 12T structure has a lower power consumption and larger write and read SNMs. In addition, the read operation is performed differentially at a high read current. The improvements are obtained at the cost of additional area. In addition, the proposed cell adds one junction capacitance per cell to the bitlines. Using SOI/FINFET structures the added capacitance may be minimized. To evaluate the efficiency of the proposed cell structure, several parameters of SRAM and their variations under random dopant fluctuations are studied. In the study, different subthreshold SRAM structures are implemented and compared using a 32nm standard bulk MOSFET technology.
  • Keywords
    MOSFET; SRAM chips; silicon-on-insulator; MOSFET technology; SOI/FINFET structure; SRAM structure; capacitance; low power consumption; random dopant fluctuation; subthreshold SRAM cell; Random access memory; Variable speed drives;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits (EDSSC), 2010 IEEE International Conference of
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-9997-7
  • Type

    conf

  • DOI
    10.1109/EDSSC.2010.5713673
  • Filename
    5713673