DocumentCode
252597
Title
Near-threshold voltage operation of a nonvolatile SRAM cell based on pseudo-spin-FinFET architecture
Author
Shuto, Y. ; Yamamoto, S. ; Sugahara, S.
Author_Institution
Imaging Sci. & Eng. Lab., Tokyo Inst. of Technol., Yokohama, Japan
fYear
2014
fDate
6-9 Oct. 2014
Firstpage
1
Lastpage
2
Abstract
The bias assist techniques and power switch design for stable near-threshold voltage operations of the NV-SRAM cell are investigated. Although the pull-up of VDD is necessary for the store operation, this executes only at the moment of the shutdown of the cell and the energy required for the store operation can be completely compensated by the shutdown during a period prescribed by break-even time [8]. The NV-SRAM cell using PS-FinFETs is promising for the NVPG architecture of near-threshold-voltage CMOS logic systems.
Keywords
CMOS logic circuits; CMOS memory circuits; SRAM chips; power MOSFET; CMOS logic systems; bias assist techniques; near-threshold voltage operation; nonvolatile SRAM cell; power switch design; pseudospin-FinFET architecture; FinFETs; Magnetic resonance imaging; Magnetic tunneling; Standards;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2014 IEEE
Conference_Location
Millbrae, CA
Type
conf
DOI
10.1109/S3S.2014.7028239
Filename
7028239
Link To Document