• DocumentCode
    252597
  • Title

    Near-threshold voltage operation of a nonvolatile SRAM cell based on pseudo-spin-FinFET architecture

  • Author

    Shuto, Y. ; Yamamoto, S. ; Sugahara, S.

  • Author_Institution
    Imaging Sci. & Eng. Lab., Tokyo Inst. of Technol., Yokohama, Japan
  • fYear
    2014
  • fDate
    6-9 Oct. 2014
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The bias assist techniques and power switch design for stable near-threshold voltage operations of the NV-SRAM cell are investigated. Although the pull-up of VDD is necessary for the store operation, this executes only at the moment of the shutdown of the cell and the energy required for the store operation can be completely compensated by the shutdown during a period prescribed by break-even time [8]. The NV-SRAM cell using PS-FinFETs is promising for the NVPG architecture of near-threshold-voltage CMOS logic systems.
  • Keywords
    CMOS logic circuits; CMOS memory circuits; SRAM chips; power MOSFET; CMOS logic systems; bias assist techniques; near-threshold voltage operation; nonvolatile SRAM cell; power switch design; pseudospin-FinFET architecture; FinFETs; Magnetic resonance imaging; Magnetic tunneling; Standards;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2014 IEEE
  • Conference_Location
    Millbrae, CA
  • Type

    conf

  • DOI
    10.1109/S3S.2014.7028239
  • Filename
    7028239