DocumentCode
252689
Title
Nano-scale tip fabricated by electro-chemical machining for nano lithography
Author
Yuan-Jen Chang ; Han-Kuan Huang
Author_Institution
Dept. of Mech. Eng., Nat. Yunlin Univ. of Sci. & Technol., Yunlin, Taiwan
fYear
2014
fDate
13-16 April 2014
Firstpage
126
Lastpage
129
Abstract
Tip-based nanolithography provides a flexible nano-lithographic technology. The tip fabrication is the main challenge of the technology. In this paper, we propose to combine the dry etching of photoresist and electro-chemical machining to reduce the size of the tip opening. We successfully fabricate a tip opening with the dimension of 220 nm. After lithography and lift-off, the gold dot patterns with a diameter of 200 nm are demonstrated.
Keywords
electrochemical machining; gold; nanofabrication; nanolithography; photoresists; Au; electrochemical machining; flexible nanolithographic technology; gold dot patterns; nanoscale tip fabrication; photoresist dry etching; size 200 nm; size 220 nm; tip-based nanolithography; Copper; Electronic countermeasures; Fabrication; Nanolithography; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
Conference_Location
Waikiki Beach, HI
Type
conf
DOI
10.1109/NEMS.2014.6908774
Filename
6908774
Link To Document