Progress in Use of Ultra-High Vacuum Cathodic Arcs for Deposition of Thin Film Superconducting Layers

Author

Langner, J. ; Sadowski, M.J. ; Strzyzewski, P. ; Mirowski, R. ; Witkowski, J. ; Tazzari, S. ; Catani, L. ; Cianchi, A. ; Lorkiewicz, J. ; Russo, R. ; Paryjczak, T. ; Rogowski, J. ; Sekutowicz, J.

Author_Institution

Andrzej Soltan Inst. for Nucl. Studies, Otwock-Swierk

Volume

2

fYear

2006

fDate

25-29 Sept. 2006

Firstpage

535

Lastpage

538

Abstract

The paper reports on recent progress in the application of the UHV arc technology, which was proposed as an alternative solution for the deposition of thin superconducting films of pure niobium (Nb) upon the inner surfaces of RF cavities designed for particle accelerators. There are presented new experimental studies aimed at the deposition of superconducting films of pure niobium (Nb) and lead (Pb) needed for the modern accelerator technology. The main experimental results and characteristics of arc-deposited thin superconducting films are discussed, and the progress achieved recently in the formation of such films is presented

Keywords

lead; niobium; particle accelerators; superconducting thin films; vacuum arcs; vacuum deposition; Nb; Pb; RF cavities; UHV arc technology; particle accelerators; pure niobium; superconducting layers; thin film deposition; thin superconducting films; ultra-high vacuum cathodic arcs; Lead; Linear particle accelerator; Niobium; Paper technology; Radio frequency; Sputtering; Superconducting epitaxial layers; Superconducting films; Superconducting thin films; Vacuum arcs;

fLanguage

English

Publisher

ieee

Conference_Titel

Discharges and Electrical Insulation in Vacuum, 2006. ISDEIV '06. International Symposium on

Conference_Location

Matsue

ISSN

1093-2941

Print_ISBN

1-4244-0191-7

Electronic_ISBN

1093-2941

Type

conf

DOI

10.1109/DEIV.2006.357356

Filename

4194937