DocumentCode
252801
Title
Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing
Author
Kun-Tse Tu ; Chen-Kuei Chung
Author_Institution
Dept. of Mech. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
fYear
2014
fDate
13-16 April 2014
Firstpage
382
Lastpage
385
Abstract
We report the experimental and analysis results of micro parts processing using 1064 nm Nd:YVO4 laser direct-write micro patterning of indium tin oxide (ITO) thin films and then followed by electroforming on the patterns. Compared with conventional photolithographic and etching technologies, direct-write micro-patterns of ITO using Nd:YVO4 laser at proper control can achieve high quality of surface without requiring numerous processing steps. Using diffractive multiple Nd:YVO4 beam, the ITO thin film could be removed without any damage to the glass structure. After laser patterning, a high overlapping area of laser spot was used to pattern the electrode layer on film surface for obtaining a fine ablated edge profile. Accordingly, the micro parts can be obtained using electroforming and release process via laser-patterned ITO films. The new micro parts processing is a maskless, dry and low-cost process instead of the complex photolithography, sputtering and sacrificial layer.
Keywords
electroforming; glass; indium compounds; laser materials processing; ITO; electroforming; fine ablated edge profile; glass structure; laser direct write micro patterning; micro parts processing; selective patterning; wavelength 1064 nm; Electrodes; Glass; Indium tin oxide; Laser ablation; Laser beams; Substrates; Nd; Simulation; Sub-spot-size; YVO4 ;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
Conference_Location
Waikiki Beach, HI
Type
conf
DOI
10.1109/NEMS.2014.6908832
Filename
6908832
Link To Document