• DocumentCode
    252801
  • Title

    Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing

  • Author

    Kun-Tse Tu ; Chen-Kuei Chung

  • Author_Institution
    Dept. of Mech. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
  • fYear
    2014
  • fDate
    13-16 April 2014
  • Firstpage
    382
  • Lastpage
    385
  • Abstract
    We report the experimental and analysis results of micro parts processing using 1064 nm Nd:YVO4 laser direct-write micro patterning of indium tin oxide (ITO) thin films and then followed by electroforming on the patterns. Compared with conventional photolithographic and etching technologies, direct-write micro-patterns of ITO using Nd:YVO4 laser at proper control can achieve high quality of surface without requiring numerous processing steps. Using diffractive multiple Nd:YVO4 beam, the ITO thin film could be removed without any damage to the glass structure. After laser patterning, a high overlapping area of laser spot was used to pattern the electrode layer on film surface for obtaining a fine ablated edge profile. Accordingly, the micro parts can be obtained using electroforming and release process via laser-patterned ITO films. The new micro parts processing is a maskless, dry and low-cost process instead of the complex photolithography, sputtering and sacrificial layer.
  • Keywords
    electroforming; glass; indium compounds; laser materials processing; ITO; electroforming; fine ablated edge profile; glass structure; laser direct write micro patterning; micro parts processing; selective patterning; wavelength 1064 nm; Electrodes; Glass; Indium tin oxide; Laser ablation; Laser beams; Substrates; Nd; Simulation; Sub-spot-size; YVO4;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2014 9th IEEE International Conference on
  • Conference_Location
    Waikiki Beach, HI
  • Type

    conf

  • DOI
    10.1109/NEMS.2014.6908832
  • Filename
    6908832